EUV

Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made using Low-NA EUV litho tools. This is why the latest announcement from ASML is particularly notable. As spotted by Computerbase, ASML this week has delivered its first updated Twinscan NXE:3800E lithography machine for fab installation. The latest iteration of the company's line of 0.33 numerical aperture (Low-NA) lithography scanners, the NXE:3800E is aimed at making chips on 2nm and 3nm-class technologies. Chipmakers have a need for speed! The first TWINSCAN NXE:3800E...

GlobalFoundries to Expand Capacities, Build a Fab in China

GlobalFoundries has announced plans to expand manufacturing capacities for its leading edge and mainstream production technologies in the U.S., Germany and Singapore. After the upgrades of the fabs are...

49 by Anton Shilov on 2/11/2017

Intel to Equip Fab 42 for 7 nm

Intel this week announced plans to bring its Fab 42 online to produce semiconductors using a 7 nm fabrication process. It will take three to four years, and the...

24 by Anton Shilov on 2/9/2017

GlobalFoundries Updates Roadmap: 7 nm in 2H 2018, EUV Sooner Than Later?

GlobalFoundries recently announced the first details about its next generation 7 nm manufacturing technology, which is being developed in-house, and revealed plans to start production of chips using the...

76 by Anton Shilov on 10/3/2016

Intel’s ‘Tick-Tock’ Seemingly Dead, Becomes ‘Process-Architecture-Optimization’

As reported at The Motley Fool, Intel’s latest 10-K / annual report filing would seem to suggest that the ‘Tick-Tock’ strategy of introducing a new lithographic process note in...

98 by Ian Cutress on 3/22/2016

EUV Lithography Makes Good Progress, Still Not Ready for Prime Time

At the recent annual SPIE Advanced Lithography conference, Intel, TSMC and other leading semiconductor companies said that significant strides have been made in extreme ultraviolet lithography (EUVL) over the...

38 by Anton Shilov on 3/10/2016

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